منابع مشابه
Low-k interlevel dielectrics technology
Semiconductor manufacturers have been shrinking transistor size in integrated circuits (IC) to improve chip performance. This has resulted in increased speed and device density, both of which were described well by what is known as Moore’s Law – chip performance will double every ~18 months. The speed of an electrical signal in an IC is governed by two components – the switching time of an indi...
متن کاملReliability Challenges with Ultra-Low k Interlevel Dielectrics
The adoption of ultra-low k dielectric materials in the pursuit of greater performance will pose reliability challenges quite unlike what we have previously experienced. The ultra-low k (ULK) dielectrics are completely different from the materials we have traditionally used. Unfortunately, the properties that make them desirable from an electrical point of view make them undesirable from a mech...
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Articles you may be interested in Effects of vacuum ultraviolet irradiation on trapped charges and leakage currents of low-k organosilicate dielectrics Appl. Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation Appl. Influence of electron-beam and ultraviolet treatments on low-k porous dielectrics
متن کاملComputer simulation of nanoporous low - k dielectrics for microelectronic applications
32 Driving the interconnect dimensions of microelectronic circuits to smaller sizes, the delay time caused by the electrical resistance of the Aluminium or Copper wires and the capacitors generated by neighbouring wires and the insulating material becomes the essential limiting factor of the performance of the circuits [1-3]. Fig. 1 shows the delay time as a function of the interconnect dimensi...
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Articles you may be interested in Effect of vacuum-ultraviolet irradiation on the dielectric constant of low-k organosilicate dielectrics Appl. Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation Appl. The effects of plasma exposure and vacuum ultraviolet irradiation on photopatternable low-k dielectric materials Effect of vacuum ultraviolet and ...
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ژورنال
عنوان ژورنال: The Electrochemical Society Interface
سال: 2005
ISSN: 1064-8208,1944-8783
DOI: 10.1149/2.f06052if